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Impact of lateral asymmetric channel doping on deep submicrometer mixed-signal device and circuit performance

机译:横向非对称沟道掺杂对深亚微米混合信号器件和电路性能的影响

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摘要

In this paper, we have systematically investigated the effect of scaling on analog performance parameters in lateral asymmetric channel (LAC) MOSFETs and compared their performance with conventional (CON) MOSFETs for mixed-signal applications. Our results show that, in LAC MOSFETs, there is significant improvement in the intrinsic device performance for analog applications (such as device gain, gm/ID etc.) down to the 70-nm technology node, in addition to an improvement in drive current and other parameters over a wide range of channel lengths. A systematic comparison on the performance of amplifiers and CMOS inverters with CON and LAC MOSFETs is also performed. The tradeoff between power dissipation and device performance is explored with detailed circuit simulations for both CON and LAC MOSFETs.
机译:在本文中,我们系统地研究了缩放对横向非对称沟道(LAC)MOSFET中模拟性能参数的影响,并将其性能与常规(CON)MOSFET在混合信号应用中的性能进行了比较。我们的结果表明,在LAC MOSFET中,除了驱动电流有所改善之外,对于模拟应用(例如,器件增益,gm / ID等),直到70nm技术节点,其固有的器件性能也有了显着改善。和其他参数在很大的信道长度范围内。还对具有CON和LAC MOSFET的放大器和CMOS反相器的性能进行了系统比较。通过针对CON和LAC MOSFET的详细电路仿真,探索了功耗与器件性能之间的权衡。

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